Title:
VACUUM DRYING DEVICE AND VACUUM DRYING TREATMENT METHOD
Document Type and Number:
Japanese Patent JP2022170308
Kind Code:
A
Abstract:
To make a drying time of a solution on a substrate more uniform within the plane of a substrate.SOLUTION: A vacuum drying device 1 that dries a solution on a substrate G under reduced pressure includes a processing container configured to be depressurized and containing the substrate, a substrate mounting portion provided in the processing container and on which the substrate is mounted, and a solvent collecting portion 50 provided above the substrate mounting portion and collecting a solvent in the solution vaporized from the substrate during the drying process under reduced pressure, the processing container has an exhaust port 13b connected to an exhaust mechanism 40 that exhausts the inside of the processing chamber below the outer periphery of the substrate mounting portion, and the solvent collection portion is formed by a plurality of dividing plates 60 arranged in the horizontal direction. Each of the dividing plates is inclined such that the peripheral edge side of the substrate mounting portion is higher, and an opening 70 through which the gas above the substrate passes is formed between the mutually adjacent dividing plates, and the solvent collection portion rectifies the gas above the substrate such that the gas above the substrate passes through the opening, passes above the solvent collection portion, and goes toward the exhaust port.SELECTED DRAWING: Figure 3
Inventors:
SADA TETSUYA
UEDA TOSHIHIKO
UEDA TOSHIHIKO
Application Number:
JP2021076360A
Publication Date:
November 10, 2022
Filing Date:
April 28, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H05B33/10; F26B5/04; H01L51/50
Attorney, Agent or Firm:
Kanemoto Tetsuo
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine