Title:
減圧乾燥装置
Document Type and Number:
Japanese Patent JP6863747
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a vacuum drying device capable of suppressing a substrate from vibrating and preventing the substrate from being damaged even if a substrate-housing part is rapidly opened from the state under reduced pressure environment to an atmospheric pressure state.SOLUTION: This invention relates to a vacuum drying device for drying a coating film formed on a substrate under reduced pressure environment, including: a chamber part which forms a substrate-housing part in which a substrate is stored; a catch pin for holding the substrate stored in the substrate-housing part at a predetermined height position; and a lift pin for placing the supplied substrate on the catch pin and for discharging the substrate on the catch pin. The vacuum drying device further includes a support pin housed in the chamber part if the substrate-housing part is under the reduced pressure environment in a state where the substrate is held by the catch pin, and the support pin abuts on the substrate held by the catch pin to assist the support of the substrate when the reduced pressure environment of the substrate-housing part is returned to an atmospheric pressure.SELECTED DRAWING: Figure 1
Inventors:
Takashi Yoneda
Kagaya Manabu
Kagaya Manabu
Application Number:
JP2017000419A
Publication Date:
April 21, 2021
Filing Date:
January 05, 2017
Export Citation:
Assignee:
Toray Engineering Co., Ltd.
International Classes:
F26B5/04; B05C9/12; F26B9/06; H01L21/683
Domestic Patent References:
| JP10076211A | ||||
| JP2004241702A | ||||
| JP2015159248A | ||||
| JP2009111234A |
Foreign References:
| US6499367 | ||||
| WO2008114337A1 |