Title:
減圧乾燥装置、減圧乾燥方法およびプログラム
Document Type and Number:
Japanese Patent JP7381526
Kind Code:
B2
Abstract:
The invention provides a reduced-pressure drying device, a reduced-pressure drying method, and a program. The present invention addresses the problem of more uniformly drying a coating film formed on the upper surface of a substrate. In the chamber, the support part supports the substrate from below, the exhaust part exhausts the gas environment in the chamber, and the gas supply part supplies gas into the chamber. The lifting unit repeatedly lifts and lowers the support unit when at least one of the exhaust by the exhaust unit and the air supply by the air supply unit is performed.
Inventors:
Kentaro Nishioka
Application Number:
JP2021134759A
Publication Date:
November 15, 2023
Filing Date:
August 20, 2021
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
F26B5/04; F26B9/06; H01L21/027
Domestic Patent References:
| JP10076211A | ||||
| JP2009111234A | ||||
| JP2010103480A | ||||
| JP2009061381A | ||||
| JP2009094182A | ||||
| JP6042862A | ||||
| JP2011064400A | ||||
| JP9320949A | ||||
| JP2002372368A |
Foreign References:
| KR1020090115308A |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita
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