Title:
VACUUM EVAPORATION SYSTEM
Document Type and Number:
Japanese Patent JP2015067850
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a vacuum evaporation system which can increase a total dispersion amount of a vapor deposition material from an evaporation source and improve film thickness uniformity to achieve a faster vapor deposition process.SOLUTION: A vacuum evaporation system includes a plurality of crucibles 20a, 20b which deposit a film of a vapor deposition material in opposition to a base plate arranged in a direction orthogonal to the longitudinal direction, and a heater 21-5 provided on outside-located one of longitudinal side faces of outermost crucibles 20a of the crucibles 20a, 20b.
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Inventors:
OGATA TOMOHIKO
MIYAKE TATSUYA
MATSUURA HIROYASU
KUSUNOKI TOSHIAKI
YAMAMOTO KENICHI
MIYAKE TATSUYA
MATSUURA HIROYASU
KUSUNOKI TOSHIAKI
YAMAMOTO KENICHI
Application Number:
JP2013201817A
Publication Date:
April 13, 2015
Filing Date:
September 27, 2013
Export Citation:
Assignee:
HITACHI HIGH TECH FINE SYSTEMS CORP
International Classes:
C23C14/24; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Polaire Patent Business Corporation