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Title:
VACUUM FILM DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2003096564
Kind Code:
A
Abstract:

To provide a vacuum film deposition apparatus in which a monitor glass 13, a mask 42 having an aperture 44 which covers the monitor glass 13 to deposit a monitor film deposition part 13a are stably arranged close to each other, the clear monitor film deposition part 13a which prevent any spread and blur over the monitor glass 13 during the film deposition is deposited, and a holder 8 need not be positioned to a dome 5.

The monitor glass 13 is provided on a bottom part of the cylindrical holder 8 which is placed and supported by the dome 5 in an elevating/ lowering manner, a holder receiving part 27 which positions the monitor glass 13 at the monitoring position by the abutting on an abutting surface 11 of an upper part of the holder 8, and the mask 42 is elevated so that the abutting surface 11 of the upper part of the holder 8 is abutted on the holder receiving part 27, and pressed against a lower part of the holder 8 to perform the film deposition on the substrate.


Inventors:
YAMABE SHINICHI
Application Number:
JP2001287966A
Publication Date:
April 03, 2003
Filing Date:
September 21, 2001
Export Citation:
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Assignee:
SHIN MEIWA IND CO LTD
International Classes:
B01J19/00; C23C14/54; (IPC1-7): C23C14/54; B01J19/00
Attorney, Agent or Firm:
Hiroshi Maeda (7 outside)