Title:
VACUUM HEAT TREATMENT DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2011137596
Kind Code:
A
Abstract:
To prevent deterioration of an O-ring for sealing, of a vacuum heat treatment device.
A heating container (3) is connected to an exhaust pump, and joint surfaces of an opening circumferential flange (13) of a joint chamber received in a vacuum treatment chamber and an opening circumferential flange (15) of the heating container (3) are sealed by the O-ring (21). A hood-shaped projecting section (24) is disposed on an opening edge of the opening flange (13) of the joint chamber, and radiation heat enters from a clearance gap of the joint surfaces of about 1 μ, so that the O-ring is not heated, and the deterioration of the O-ring is prevented.
Inventors:
SHIBAGAKI MASAHATA
SEKIGUCHI ATSUSHI
DOI HIROSHI
MASHITA KAORI
SASUGA YUICHI
SEKIGUCHI ATSUSHI
DOI HIROSHI
MASHITA KAORI
SASUGA YUICHI
Application Number:
JP2009297950A
Publication Date:
July 14, 2011
Filing Date:
December 28, 2009
Export Citation:
Assignee:
CANON ANELVA CORP
International Classes:
F27B5/05; F27D11/08; H05B1/00; H05B7/00
Domestic Patent References:
| JPH10312966A | 1998-11-24 | |||
| JP2007280905A | 2007-10-25 | |||
| JPS57121666U | 1982-07-28 | |||
| JPH10312966A | 1998-11-24 | |||
| JP2007280905A | 2007-10-25 | |||
| JPS57121666U | 1982-07-28 |
Attorney, Agent or Firm:
Masao Okabe
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama