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Title:
VACUUM HEAT TREATMENT METHOD AND DEVICE
Document Type and Number:
Japanese Patent JPH0257895
Kind Code:
A
Abstract:

PURPOSE: To reduce incurring of a heat loss occasioned by introduction of gas and to enable holding of temperature in a furnace chamber at a specified value by means of a relative small power source by a method wherein an airtight chamber to contain a substance to be treated is provided, inactive gas is introduced in a furnace chamber, and gas for treatment is introduced in the airtight chamber so that the pressure thereof is made equal to that of the inactive gas to perform heat treatment of the substance to be treated.

CONSTITUTION: A substance 8 to be treated is contained in an airtight chamber 9 and a body 9a and a cover body 9b are separated away from each other through backward movement of cylinders 13 and 17, and gas in a furnace chamber 1 is exhausted through a vacuum exhaust port 3 to bring the interior of the furnace chamber into a 1Torr vacuum state. Through actuation of a heater 7, the substance 8 to be treated is heated to a specified temperature. Ar gas is introduced through a gas introduction port 4, and the interior of the furnace chamber 1 and the interior of the airtight chamber 9 are brought into, for example, a 150Torr state. Thereafter, the cylinders 13 and 17 are moved forward to close the airtight chamber 9. Hydrogen gas is introduced through a second gas introduction port 16 and is exhausted through a second vacuum exhaust port 15 and a pressure in the airtight chamber is made approximately equal to an Ar gas pressure in the furnace chamber 1. This constitution applies reduction treatment on the substance 8 to be treated.


Inventors:
SUDO SHIN
Application Number:
JP20735488A
Publication Date:
February 27, 1990
Filing Date:
August 23, 1988
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
F27B17/00; C21D1/773; F27D7/06; (IPC1-7): C21D1/773; F27B17/00; F27D7/06
Attorney, Agent or Firm:
Kinichi Kitamura (3 others)



 
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