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Title:
VACUUM PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2007073541
Kind Code:
A
Abstract:

To provide a vacuum processing device which can prevent mixing of moisture into a vacuum processing chamber certainly.

Gate valves 30a and 30b having valve elements 31a and 31b, respectively, are arranged doubly between a vacuum processing chamber 10 and a load lock chamber 20. The load lock chamber 20 is connected with three exhaust pipes 21, 22 and 23 having different conductances which are connected with a vacuum pump 60 through open/close valves 62, 63 and 64, respectively. An N2 gas supply 26 for introducing N2 gas into the load lock chamber 20 is also connected.


Inventors:
SHIMURA AKIHIKO
KONDO HIROSHI
NABEYAMA HIROKI
Application Number:
JP2005255293A
Publication Date:
March 22, 2007
Filing Date:
September 02, 2005
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/205; C23C14/56; C23C16/44
Domestic Patent References:
JP2000058524A2000-02-25
JP2002329763A2002-11-15
JPH06104180A1994-04-15
JP2001291758A2001-10-19
JP2002110560A2002-04-12
JP2004119595A2004-04-15
JPH08335572A1996-12-17
JP2004241566A2004-08-26
Attorney, Agent or Firm:
Hiroshi Takayama



 
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