Title:
真空ポンプ、主センサ、及び、ネジ溝ステータ
Document Type and Number:
Japanese Patent JP6842328
Kind Code:
B2
Abstract:
To provide a vacuum pump which includes a sensor capable of detecting that, even when a chemical composition of a deposit inside a flow path cannot be specified, the deposit has accumulated to a prescribed thickness in the flow path. A vacuum pump 1 includes: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor 42 for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor 42 includes at least a pair of electrodes 54 and 56 disposed in the internal flow path at an interval corresponding to the prescribed thickness, and a capacitance detection circuit 46 which is connected to the pair of electrodes 54 and 56 and which detects a capacitance between the pair of electrodes 54 and 56, and the capacitance detection circuit 46 detects that a deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in an increase rate of the capacitance.
Inventors:
Takeshi Kabazawa
Application Number:
JP2017057192A
Publication Date:
March 17, 2021
Filing Date:
March 23, 2017
Export Citation:
Assignee:
Edwards Co., Ltd.
International Classes:
G01B7/06; F04D19/04
Domestic Patent References:
| JP6101655A | ||||
| JP60217982A | ||||
| JP1123511A |
Foreign References:
| WO2012077411A1 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
▲吉▼田 和彦
Mitsuru Matsushita
Ichiro Kurasawa
Yasushi Yamamoto
Yamamoto Kousuke
Disciple Maru Ken
▲吉▼田 和彦
Mitsuru Matsushita
Ichiro Kurasawa
Yasushi Yamamoto
Yamamoto Kousuke