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Patent Searching and Data


Title:
低熱伝導率ガスをポンピングするための真空ポンピングシステム
Document Type and Number:
Japanese Patent JP4166491
Kind Code:
B2
Abstract:
In a vacuum pumping system according to the invention, the Roots or claw multistage dry primary pump discharges into an outlet stage including an additional piston or membrane pump connected in parallel with a preliminary evacuation pipe including a check valve. The outlet stage very significantly reduces heating of the primary pump and thereby enables the vacuum pumping system to pump efficiently and without damage gases with a low thermal conductivity, such as argon or xenon.

Inventors:
Michel Pieucheuille
Application Number:
JP2002073658A
Publication Date:
October 15, 2008
Filing Date:
March 18, 2002
Export Citation:
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Assignee:
Alcatel-Lucent
International Classes:
F04B37/16; F04B37/14; F04B41/06; F04B45/04; F04C23/00; F04C25/02; F04C28/10; F04C29/12; F04C18/12
Foreign References:
US4504201
US5584669
US5947694
US5709537
DE3710782A1
DE4443387B
EP9319939A2
Attorney, Agent or Firm:
Yoshio Kawaguchi
Makoto Ono
Chihiro Watanabe
Kenkyo Kanayama
Katsuma Osaki
Mitsuaki Tsubokura