Title:
真空直線フィードスルー及び当該真空直線フィードスルーを有する真空システム
Document Type and Number:
Japanese Patent JP6620147
Kind Code:
B2
Abstract:
A vacuum linear feed-through (20), e.g., for an EUV lithography system, includes: a vacuum diaphragm bellows (21), which has a first end (21a) attaching a component and a second end (21b), opposite the first end, attaching to a vacuum housing, and an actuator device (27) generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (30, 30′), connected to the bellows at the first end, and at least one second shield (31, 31′), connected to the bellows at the second end. The first and second shield annularly surround the bellows, and the first and second shield overlap in the longitudinal direction of the bellows (21). At least one first shield and at least one second shield are formed of a permanently magnetic material, and/or the feed-through has a voltage-generating device (33) generating an electric field (E) between the first shield and the second shield.
Inventors:
Matthias Ruth
Eugen Foka
Eugen Foka
Application Number:
JP2017518449A
Publication Date:
December 11, 2019
Filing Date:
September 23, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; F04B45/00; F04B45/02
Domestic Patent References:
| JP2002067312A1 | ||||
| JP2007180467A | ||||
| JP2010275593A |
Foreign References:
| US20060191484 | ||||
| US20090200268 | ||||
| US20090246374 |
Attorney, Agent or Firm:
Kenji Sugimura
Mitsutsugu Sugimura
Miyata Kousuke
Mitsutsugu Sugimura
Miyata Kousuke