To treat a gas for temperature adjustment safely and at a low cost by exhausting the gas for temperature adjustment from the rear stage of an exhaust device, in a vacuum treatment device which makes the gas for temperature adjustment flow into a space formed inside a base retaining mechanism and controls the temperature of a base.
A gas for temperature adjustment is introduced into a space formed inside a cathode which concurrently serves as a base retaining mechanism from a feed device through a a valve 9, a flow rate regulator 8 and a pipe for introducing the gas for temperature adjustment. The gas for temperature adjustment which is introduced into the space formed inside the cathode resultantly controls the temperature of a base installed on the cathode by controlling the internal heat conduction of the space or cooling the cathode directly. Further the gas for temperature adjustment is exhausted from the cathode by way of an exhaust pipe 11 after the gas controlls the temperature of the base. The exhaust pipe 11 is connected to piping 22 at the rear stage of an exhaust device 20. Thus the gas for temperature adjustment is exhausted from the rear stage of the exhaust device 20.
SHIRASAGO TOSHIYASU
MURAYAMA HITOSHI
HOSOI KAZUTO
OTSUKA TAKASHI
TAZAWA DAISUKE
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