PURPOSE: To form multilayer thin films and to improve formation efficiency without exchanging evaporating sources at every formation of one layer.

CONSTITUTION: The vacuum vapor deposition device is constituted of a vacuum chamber 1, a discharge port 2 for evacuating the inside of the chamber to a vacuum, a substrate holder 3, the evaporating sources 81, 82 which are disposed in at least two pieces, disposing parts 41, 42 to be disposed with the evaporating sources, hating means 51, 52 for the respective evaporating sources and power sources 61, 62 for supplying electric power to the respective heating means. This device is provided with a modulating means 7 for modulating the electric power at 0.01 to 50 Hz period and shifting the phase of the modulated electric power to be supplied to at least two pieces of the heating means 41, 42.