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Patent Searching and Data


Title:
VAPOR DEPOSITION APPARATUS AND OXYGEN OR OXYGEN- CONTAINING GAS SUPPLY APPARATUS
Document Type and Number:
Japanese Patent JP2002150551
Kind Code:
A
Abstract:

To provide a vapor deposition apparatus which is capable of uniformly supplying gaseous oxygen in the width direction under a high temperature and improving electromagnetic transduc characteristics of a magnetic recording medium and oxygen or oxygen-containing gas supply apparatus used for this apparatus.

This vapor deposition apparatus is an apparatus to deposit a magnetic material by evaporation in an oxygen or oxygen-containing atmosphere and in the apparatus, a plurality of pieces of gas blowing openings are formed at prescribed intervals in a gas supply section for supplying oxygen or an oxygen-containing gas. This oxygen or oxygen-containing gas supply apparatus is used for this vapor deposition system, is used in depositing a magnetic material in the oxygen or oxygen-containing atmosphere and the plurality of pieces of the gas blowing openings are formed at prescribed intervals.


Inventors:
Sai, Teruo
Sato, Susumu
Application Number:
JP2000000339261
Publication Date:
May 24, 2002
Filing Date:
November 07, 2000
Export Citation:
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Assignee:
SONY CORP
International Classes:
C23C14/06; C23C14/24; G11B5/85; C23C14/06; C23C14/24; G11B5/85; (IPC1-7): G11B5/85; C23C14/06; C23C14/24