Title:
VAPOR DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2004353030
Kind Code:
A
Abstract:
To provide a vapor deposition apparatus for inexpensively vapor-depositing an adequate thin-film on a large surface substrate in a short period of time.
The vapor deposition apparatus for forming a thin film on the substrate 2 by heating and vaporizing a material 1 charged in an evaporation source 5 and depositing the vapor onto the substrate 2 comprises a plurality of guide sections 4 for moving the evaporation source arranged side by side so as to face the substrate 2, and one or more evaporation sources 5 each installed on the guide sections 4, each of which can move along the guide sections 4.
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Inventors:
HIRAGA YASUHIDE
Application Number:
JP2003151367A
Publication Date:
December 16, 2004
Filing Date:
May 28, 2003
Export Citation:
Assignee:
TOKKI KK
International Classes:
C23C14/24; H01L21/20; H01L51/50; H05B33/14; H05B33/10; (IPC1-7): C23C14/24; H05B33/10; H05B33/14
Attorney, Agent or Firm:
Tsuyoshi Yoshii
Masae Yoshii
Masae Yoshii