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Title:
VAPOR DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2010053373
Kind Code:
A
Abstract:

To provide a vapor deposition apparatus which can form a layer on an appropriate part.

The vapor deposition apparatus 1 is directed for forming a reflection layer on a screen 7 by vapor deposition. In a light incidence side of the screen 7, horizontal faces and inclined faces which intersect each other at a predetermined angle are alternately formed along a predetermined direction. The vapor deposition apparatus 1 has a cooling roll 33 for supporting the screen 7, and a crucible 4 which is arranged so as to face to the inclined faces and forms the reflection layer on the horizontal faces by vaporizing a vapor deposition material. The screen 7 is supported by the cooling roll 33 along a vertical direction. The horizontal faces are formed so as to direct a head side in the vertical direction and are formed alternately with the inclined faces along the vertical direction. The crucible 4 is arranged in the head side in the vertical direction of the screen 7 which is supported by the cooling roll 33. Thereby, the vapor deposition apparatus can deposit the vapor deposition material only on the inclined faces of the screen 7, and can form the reflection layer only on the inclined faces.


Inventors:
KITABAYASHI MASASHI
Application Number:
JP2008216838A
Publication Date:
March 11, 2010
Filing Date:
August 26, 2008
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
C23C14/24; G03B21/60
Domestic Patent References:
JP2002283489A2002-10-03
JPH0883712A1996-03-26
JP2006330145A2006-12-07
JPH01225768A1989-09-08
JP2002283489A2002-10-03
JPH0883712A1996-03-26
JP2006330145A2006-12-07
JPH01225768A1989-09-08
Foreign References:
WO2002065208A12002-08-22
WO2002065208A12002-08-22
Attorney, Agent or Firm:
Intellectual Property Office