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Title:
VAPOR DEPOSITION DEVICE
Document Type and Number:
Japanese Patent JPS59142840
Kind Code:
A
Abstract:

PURPOSE: To enable long-term and satisfactory production of a film deposited by evaporation without film contamination by making it possible to suppress the emission of a filament material of an electron beam generator into a vapor deposition vessel and to prevent the early disconnection of the filament without contaminating the filament.

CONSTITUTION: A base body 1 for vapor deposition and an evaporating source 2 are disposed in an evaporating vessel 3 and an introducing pipe 6 for introducing modifying gas is provided by connecting the outlet thereof to the chamber 3 and further an electron ray generator 10 which irradiates an electron ray to the modifying gas introduced into the vessel 3 is produced. A filament 11, a cover 12 in common use as a lead-out electrode provided so as to enclose the filament 11, and an electron ray exit port 13 disposed at the part opposite to the filament in the cover 12 are provided in the generator 10. As a result, the emission of the filament material in the electron ray generator into the vapor deposition vessel is suppressed and the early disconnection of the filament is prevented without contaminating the filament, whereby the film deposited by evaporation having no contamination with the film is satisfactorily produced over a long period of time.


Inventors:
MIYOUKAN ISAO
Application Number:
JP1619783A
Publication Date:
August 16, 1984
Filing Date:
February 04, 1983
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
B01J19/00; C01B21/068; C23C14/22; C23C14/32; (IPC1-7): B01J19/08; C01B21/068; C01B33/02; C23C13/08
Attorney, Agent or Firm:
Masahiko Oi



 
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