Title:
VAPOR DEPOSITION MASK AND MANUFACTURING METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2023106977
Kind Code:
A
Abstract:
To provide a mask capable of reducing a vapor deposition defect.SOLUTION: A vapor deposition mask includes a mask body in which multiple openings are arranged in a first direction and a second direction crossing the first direction. Each of multiple openings includes a first opening having a first opening width in the first direction, a second opening having a second opening width wider than the first opening width in the first direction over the first opening, and a step arranged by communicating the first opening and the second opening. A depth of the second opening is larger than that of the first opening. In a cross-sectional view along the first direction, an angle between an upper surface of the step and a straight line connecting the upper end of the first opening and the upper end of the second opening is less than 60° degree.SELECTED DRAWING: Figure 2
Inventors:
MATSUMOTO YUKO
Application Number:
JP2022008045A
Publication Date:
August 02, 2023
Filing Date:
January 21, 2022
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C23C14/04; C23C14/56; C25D1/00; C25D1/08
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners
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