Title:
蒸着マスクおよび蒸着マスクの製造方法
Document Type and Number:
Japanese Patent JP7047828
Kind Code:
B2
Abstract:
To provide a vapor deposition mask that can cope with a large-sized substrate.SOLUTION: A vapor deposition mask 20 includes: a pair of lugs 17 constituting a pair of ends in a longitudinal direction of the vapor deposition mask 20; and an intermediate part 18 positioned between the pair of lugs 17. The intermediate part 18 is formed with a plurality of through-holes 25. The pair of lugs 17 are joined to the intermediate part 18 via a junction part 19.SELECTED DRAWING: Figure 3
Inventors:
Chikao Ikenaga
Eisuke Okamoto
Eisuke Okamoto
Application Number:
JP2019202570A
Publication Date:
April 05, 2022
Filing Date:
November 07, 2019
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/00; C23F1/00; C25D1/10; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014125671A | ||||
| JP2010251320A | ||||
| JP2004006257A | ||||
| JP2006092752A | ||||
| JP2006037203A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Nakamura Yukitaka
Satoru Asakura
Yukihiro Hotta
Kazuo Okamura
Nakamura Yukitaka
Satoru Asakura
Yukihiro Hotta
Kazuo Okamura
Previous Patent: Manufacturing method of the modeled object
Next Patent: Improved wireless communication in the vehicle macro cloud
Next Patent: Improved wireless communication in the vehicle macro cloud