Title:
VAPOR DEPOSITION MASK AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2010275598
Kind Code:
A
Abstract:
To provide a vapor deposition mask capable of reducing a damage imposed on a formed layer, since when the vapor deposition mask is adhered to a material layer of low hardness, a flaw is caused due to a difference in hardness and the display quality of an organic EL device after completion is deteriorated.
The vapor deposition mask comprises: opening parts 22 each of which has a first surface of facing a substrate to be vapor-deposited and a second surface of facing a vapor deposition source and is formed on a first area as the area corresponding to the pattern formation area of the substrate to be vapor-deposited; and spacers 35 formed on the first surface side of peripheral areas of the opening parts 22.
Inventors:
KUWABARA TAKAYUKI
ISHIHARA JUN
ISHIHARA JUN
Application Number:
JP2009130083A
Publication Date:
December 09, 2010
Filing Date:
May 29, 2009
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
C23C14/04; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka
Osamu Suzawa
Kazuhiko Miyasaka