Title:
蒸着マスク及び蒸着マスクの製造方法
Document Type and Number:
Japanese Patent JP7049593
Kind Code:
B2
Abstract:
To restrain shadow occurrence in vapor deposition process.SOLUTION: A vapor deposition mask includes: a first metal layer which is the first layer positioned at a first face side of the vapor deposition mask, and which has a first side face facing a through hole; and a second metal layer which is the second layer united with the first layer, and which has a second side face facing the through hole. Both the first side face of the first metal layer and the second side face of the second metal layer are constituted so as to be apart further from a center of the through hole in a face direction of the vapor evaporation mask as they are going from he first face side to the second face side of the vapor deposition mask. The first side face of the first metal layer has a swelling part projected to a side toward the center of the through hole in the side direction of the second metal layer. On the other hand, the second side face of the second metal layer has a recessing part at the side further from the center of the through hole in the face direction of the vapor deposition mask.SELECTED DRAWING: Figure 7
Inventors:
Satoshi Hosoda
Hiroyuki Takamiya
Hiroyuki Takamiya
Application Number:
JP2017231019A
Publication Date:
April 07, 2022
Filing Date:
November 30, 2017
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/04; C25D1/10; H01L51/50
Domestic Patent References:
| JP2016148112A |
Foreign References:
| US20170069843 |
Attorney, Agent or Firm:
Hiroyuki Nagai
Nakamura Yukitaka
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuo Okamura
Nakamura Yukitaka
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuo Okamura