Title:
VAPOR DEPOSITION MASK AND PRODUCTION METHOD THEREOF
Document Type and Number:
Japanese Patent JP2023077788
Kind Code:
A
Abstract:
To provide a vapor deposition mask that prevents decline of strength in a peripheral part by uniformizing the thickness of a mask pattern, and a production method thereof.SOLUTION: A vapor deposition mask in an embodiment includes: a mask body including a first opening region 104 provided with multiple first openings, and a second opening region 105 adjacent to the first opening region and provided with multiple second openings 103b; a holding frame 108 for supporting the mask body; and a connection part 106 connecting the mask body to the holding frame. At least a part of the second opening region overlaps the connection part. A difference between an aperture ratio in the second opening region and an aperture ratio in the first opening region is 20% or less.SELECTED DRAWING: Figure 2
Inventors:
KIMURA RYOTARO
WATABE MASAHIRO
WATABE MASAHIRO
Application Number:
JP2021191231A
Publication Date:
June 06, 2023
Filing Date:
November 25, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C23C14/04; C25D1/10; H05B33/10; H10K50/00
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners
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