Title:
VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2022167910
Kind Code:
A
Abstract:
To provide a vapor deposition mask that is configured to support a mask body with a frame body, suppresses deformation of the mask body even when being subjected to influence of expansion of each part due to heat, provides increase in size of the vapor deposition mask, maintains flatness of the vapor deposition mask, has excellent heat resistance and can secure preferable reproduction accuracy of a vapor deposition layer and deposition accuracy.SOLUTION: A vapor deposition mask 1 includes: a mask body 2 including a vapor deposition pattern 6 comprising a large number of independent vapor deposition through-holes 5; and a frame body 3 for supporting the mask body 2. The mask body 2 has a multilayer structure of two or more layers comprising a glossy layer and a matte layer.SELECTED DRAWING: Figure 2
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Inventors:
Hirohito Tamaru
Yoshihiro Kobayashi
Kiichiro Ishikawa
Yoshihiro Kobayashi
Kiichiro Ishikawa
Application Number:
JP2022126458A
Publication Date:
November 04, 2022
Filing Date:
August 08, 2022
Export Citation:
Assignee:
Maxell Co., Ltd.
International Classes:
C23C14/04; C25D1/08; H01L51/50; H05B33/10
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