Title:
VAPOR DEPOSITION MATERIAL FOR THIN FILM FORMATION AND OPTICAL THIN FILM
Document Type and Number:
Japanese Patent JP2016069679
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To suppress a splash in heating when silica glass is used as a vapor deposition material in performing vacuum deposition.SOLUTION: A vapor deposition material using SiOas a main component for thin film formation is used, the vapor deposition material being amorphous, being configured to have an existence ratio of an OH-group/Si-O coupling of a predetermined value or less to suppress a generation of a splash with a main component of Hby making it hard to react an OH-group with a H-group, and also including both amorphous and crystalline, of which boiling points are different, to avoid a state in which the splash likely occurs.SELECTED DRAWING: Figure 1
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Inventors:
SHIBA YOSHITAKA
HORIE YUKIHIRO
HORIE YUKIHIRO
Application Number:
JP2014199496A
Publication Date:
May 09, 2016
Filing Date:
September 29, 2014
Export Citation:
Assignee:
CANON OPTRON INC
International Classes:
C23C14/24; C03B20/00; C03C3/06
Attorney, Agent or Firm:
Kazuyuki Tachibana
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