Title:
VAPOR DEPOSITION METHOD
Document Type and Number:
Japanese Patent JPH01176071
Kind Code:
A
Abstract:
PURPOSE:To prevent the scattering of a sublimable substance to be vapor deposited and to stabilize vapor deposition by putting a netlike cover on a crucible and projecting electron beams on the cover. CONSTITUTION:A hearth liner 19 is set in the crucible 17 of an electron beam vapor deposition source 11, SiO2 granules 31 are put in the liner 19 and electron beams 15 from a hot filament 13 are deflected with a magnetic field and projected on the inside of the crucible 17. At this time, the crucible 17 is covered with a netlike cover 21. The beams 15 heat the cover 21 by impact, the cover 21 generates heat and the SiO2 granules 31 are heated by the cover 21. Since the scattering of the granules 31 is prevented by the cover 21, a vapor deposited film can be made free from splashes and pinholes.
Inventors:
MORITA SHINSAKU
NAKAMARU GAKUO
NAKAMARU GAKUO
Application Number:
JP33232387A
Publication Date:
July 12, 1989
Filing Date:
December 28, 1987
Export Citation:
Assignee:
NIPPON BATSUKUSU METAL KK
International Classes:
C23C14/30; (IPC1-7): C23C14/30
Attorney, Agent or Firm:
Fumio Usmura
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