Title:
VAPOR DEPOSITION PRODUCT AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3232751
Kind Code:
B2
Abstract:
PURPOSE: To improve the adhesive strength of a vapor deposition film and impart excellent resistance to washing and abrasion to a vapor deposition product.
CONSTITUTION: This vapor deposition product comprises a vapor deposition film formed through an intermediate agent containing at least a silicone-based resin 2 and silicon dioxide on the surface of an organic substrate 1. Furthermore, this method for producing the vapor deposition product is to produce the silicon dioxide by plasma treatment.
Inventors:
Okumura Jiichiro
Takao Negishi
Takao Negishi
Application Number:
JP5972393A
Publication Date:
November 26, 2001
Filing Date:
February 23, 1993
Export Citation:
Assignee:
Toray Industries, Inc.
International Classes:
D06M11/00; D06M10/10; D06M11/83; D06N3/12; D06Q1/04; D06M101/00; D06M101/16; D06M101/30; D06M101/32; (IPC1-7): D06M11/83; D06M10/10; D06Q1/04
Domestic Patent References:
| JP63197635A | ||||
| JP5194770A |
Attorney, Agent or Firm:
Toshimitsu Ban