Title:
VAPOR DEPOSITION SOURCE
Document Type and Number:
Japanese Patent JP2014237885
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a vapor deposition source which in the vapor deposition source of which type is to arrange a heater outside of a crucible, can prevent decrease in apparatus operation rate by reducing standby time until temperature of the crucible decreases after the crucible is heated, and can increase the apparatus operation rate by uniformly heating the vapor deposition material as a whole in the crucible.SOLUTION: A vapor deposition source includes: a crucible in which deposition material is placed; a first cooling mechanism for cooling the crucible, which is disposed outside the crucible; and a heating part which is disposed outside the first cooling mechanism, and heats the crucible by conducting heat to the crucible through the first cooling mechanism. The heating part can operate independently from each other and is configured with 7 or more heaters which are arranged in multi-level for each region. Each heater is controlled based on crucible temperature of each region, which is measured with a temperature sensor for each heater.
Inventors:
TAO EIJI
FUKUDA KEIJI
FUKUDA KEIJI
Application Number:
JP2013122131A
Publication Date:
December 18, 2014
Filing Date:
June 10, 2013
Export Citation:
Assignee:
CHOSHU INDUSTRY CO LTD
International Classes:
C23C14/24
Domestic Patent References:
| JPH02111873A | 1990-04-24 | |||
| JP2006104513A | 2006-04-20 | |||
| JP2011162846A | 2011-08-25 | |||
| JP2013519787A | 2013-05-30 |
Attorney, Agent or Firm:
Masanobu Kujirata