Title:
VAPOR GROWTH DEVICE
Document Type and Number:
Japanese Patent JP3542145
Kind Code:
B2
Abstract:
PURPOSE: To simultaneously process a plurality of wafers so that films having a uniform thickness can be respectively formed on the surfaces of the wafers.
CONSTITUTION: In a vapor growth device which simultaneously forms films on the surfaces of wafers 2, reaction tubes 1 having different inside diameters are prepared in a state where the tubes 1 can be exchanged in corresponding to the interval between each wafer 2 so that the interval can be made longer than the distance between the edges of the wafers to the internal walls of the tubes 1 and shorter than the two-fold of the distance.
Inventors:
Nobuyuki Mise
Masato Ikegawa
Hisayuki Kato
Masato Ikegawa
Hisayuki Kato
Application Number:
JP14030793A
Publication Date:
July 14, 2004
Filing Date:
June 11, 1993
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
H01L21/205; (IPC1-7): H01L21/205
Domestic Patent References:
| JP629214A | ||||
| JP4322426A | ||||
| JP2142121A |
Attorney, Agent or Firm:
Yasuo Sakuta
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