Title:
VAPOR PHASE GROWTH SYSTEM
Document Type and Number:
Japanese Patent JP2015109400
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a face-down type vapor phase growth system that has a structure which heats a plurality of substrates rotatably held by a susceptor using a heater formed in a predetermined linear pattern from back sides of the substrates, which can stably support the heater having a wide area without being broken even in a vapor phase growth using a plurality of large substrates.SOLUTION: In the vapor phase growth system, a reflection plate having a hole with an elongated shape and a groove for restricting rotation of a heater supporting member is disposed on an upper surface of a heater, and a τ-shaped, H-shaped, Y-shaped or U-shaped heater supporting member with a convex rotary stopper function is inserted into a gap between the hole of the reflection plate and a linear pattern of the heater so that the center part of the member penetrates through the hole and the pattern and then is rotated to contact the reflection plate and the linear pattern of the heater so as to support the heater while suspending the heater from reflection plate.
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Inventors:
MORI YUJI
ONCHI SHINTARO
ONCHI SHINTARO
Application Number:
JP2013252676A
Publication Date:
June 11, 2015
Filing Date:
December 06, 2013
Export Citation:
Assignee:
JAPAN PIONICS
International Classes:
H01L21/205; C23C16/46
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