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Title:
VAPOR WASHING METHOD AND WASHING DEVICE
Document Type and Number:
Japanese Patent JPS6443384
Kind Code:
A
Abstract:

PURPOSE: To make the remaining of impurities on a surface less than in the conventional method for immersing materials to be treated into ultra-pure water or the like by heating a washing liquid to evaporate, passing mists carried over in the vapor thereof at this time through a porous membrane to remove the mists, then bringing the vapor into contact with the materials to be treated.

CONSTITUTION: The mists carried over in the vapor are removed by using the porous membrane 101 at the time of washing the materials 107 to be treated by using the vapor of the washing liquid and, thereafter, the vapor is brought into contact with the surfaces of the materials to be treated to condensate the vapor. Water or an org. solvent insoluble in the water or the like is used as the washing liquid described above. The materials to be treated are various kinds of optical parts and electronic parts inclusive of semiconductor wafers, optical disks or magnetic disks or jigs for their production. Further, the ultra- pure water is preferably used as the water used for vapor washing of the semiconductor wafers. Consequently, the remaining of the impurities on the surface of the materials to be treated is made less than in the conventional method of immersing the materials to be treated into the ultra-pure water and vapor washing method.


Inventors:
KUROKAWA HIDEAKI
EBARA KATSUYA
TAKAHASHI SANKICHI
MATSUZAKI HARUMI
YODA HIROAKI
NITTA TAKEHISA
Application Number:
JP1987000199796
Publication Date:
February 15, 1989
Filing Date:
August 12, 1987
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
B08B3/08; C23G5/04; G11B3/58; G11B5/84; H01L21/304; (IPC1-7): B08B3/08
Domestic Patent References:
JPS6123324A1986-01-31
JPS60125282A1985-07-04
JPS61129019A1986-06-17
JPS61138582A1986-06-26
JPS60246638A1985-12-06



 
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