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Title:
VAPORIZER, FILM DEPOSITION APPARATUS, FILM DEPOSITING METHOD, AND STORAGE MEDIUM
Document Type and Number:
Japanese Patent JP2009074108
Kind Code:
A
Abstract:

To suppress generation of particles by vaporizing a liquid material with high efficiency when performing the film deposition by feeding a gaseous material formed by vaporizing the liquid material to a substrate.

Bubbles of the grain size of the nano level and positively or negatively charged are generated in a liquid material for performing the film deposition on a substrate, and the liquid material is atomized and its mist is heated and vaporized. Since very small bubbles are dispersed in the liquid material with high uniformity, when the liquid is atomized, the very fine and uniform mist can be obtained to attain an easily heat-exchangeable state. When the mist is vaporized, vaporization efficiency becomes high to suppress the production of particles.


Inventors:
SAWADA IKUO
SEGAWA SUMIE
IKEDA KYOKO
OSHITA TATSURO
Application Number:
JP2007241364A
Publication Date:
April 09, 2009
Filing Date:
September 18, 2007
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/448; H01L21/31
Domestic Patent References:
JP2006100737A2006-04-13
JP2004265938A2004-09-24
JP2006147617A2006-06-08
Attorney, Agent or Firm:
Toshio Inoue



 
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