VAPORIZER, SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD

Title:

VAPORIZER, SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD

Document Type and Number:

Japanese Patent JP2015137399

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To keep vaporization conditions constant even if a liquid level falls as a liquid raw material vaporizes.SOLUTION: There is provided a vaporizer which produces a processing gas by vaporizing a liquid raw material, and the vaporizer includes a vaporization container which contains the liquid raw material, and a partition wall which is arranged movably in a vertical direction above the liquid level of the liquid raw material contained in the vaporization container and partitions off the space in the vaporization container above the liquid level so as to form a vaporization space for the liquid raw material with the liquid level. The partition wall moves following up the liquid level falling as the liquid raw material vaporizes so as to keep the volume in the vaporization space constant.

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Inventors:

NONAKA TAKEHIRO
FUJIKURA TSUNEAKI

Application Number:

JP2014010095A

Publication Date:

July 30, 2015

Filing Date:

January 23, 2014

Export Citation:

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