Title:
VERNIER STRUCTURE FOR MEASURING OVERLAP ACCURACY AND MEASURING METHOD OF OVERLAP ACCURACY
Document Type and Number:
Japanese Patent JPH07142543
Kind Code:
A
Abstract:
PURPOSE: To reduce the stepped section of vernier, and to suppress the measurement error of overlap accuracy.
CONSTITUTION: In vernier for measuring overlap accuracy for with a pre-process in a photolithographic process, a pattern in the pre-process as a main scale 11 is formed by a punching pattern, and a vernier 13 is arranged in a punching region.
Inventors:
HIKICHI KUNIHIKO
Application Number:
JP18902593A
Publication Date:
June 02, 1995
Filing Date:
June 30, 1993
Export Citation:
Assignee:
SONY CORP
International Classes:
G01B11/00; G03F7/20; H01L21/02; H01L21/027; H01L21/66; H01L21/68; (IPC1-7): H01L21/66; G01B11/00; H01L21/02; H01L21/68
Attorney, Agent or Firm:
Toru Takatsuki
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