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Patent Searching and Data


Title:
VOLTAGE READOUT SYSTEM BY ELECTRON BEAM
Document Type and Number:
Japanese Patent JPS5779456
Kind Code:
A
Abstract:

PURPOSE: To correct an error in voltage readout due to differences of materials, by specifying materials by a reflected electron and correcting a secondary electron signal by using the radiation ratio of the secondary electron characteristics to the materials.

CONSTITUTION: When a sample 2 is irradiated with an electron beam 1, a secondary electron and a high-speed reflected electron are obtained from an electron beam probe point and then detected by corresponding detectors 4 and 3 to obtain a secondary-electron signal Ss and a reflected-electron signal Sr. The reflected-electron signal Sr is inputted to a determining circuit 5 for a secondary- electron radiation ratio having an incorporated coordinate table of secondary electron radiation ratios, thus obtaining the secondary electron radiation ratio. Then, the secondary-electron signal Ss and the secondary-electron radiation ratio are inputted to a dividing circuit 6, which finds a voltage at the probe point. Thus, unstable elements due to material effect are removed and the functions of an integrated circuit device are inspected accurately.


Inventors:
GOTOU YOSHIAKI
ISHIZUKA TOSHIHIRO
Application Number:
JP15680880A
Publication Date:
May 18, 1982
Filing Date:
November 06, 1980
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G01R31/302; G01R31/305; G01R19/155; (IPC1-7): G01R19/00