Title:
プラズマ処理装置用電圧波形生成器
Document Type and Number:
Japanese Patent JP7444875
Kind Code:
B2
Abstract:
A plasma processing apparatus may include a mechanism for generating a plasma, a processing platform for supporting a substrate to be processed, and a voltage waveform generator having an output electrically coupled to the processing platform. The voltage waveform generator includes a plurality of first buck converters arranged in parallel and coupled to the output. The first buck converters include actively switchable semiconductor switches. A control unit is configured to operate the actively switchable semiconductor switches through pulse width modulation signals, and the control unit is configured to operate the plurality of first buck converters in an interleaved manner.
Inventors:
Antonius Wilhelms Hendricks Johannes Driesen
Wooter Johann Hendrik van Henip
Wooter Johann Hendrik van Henip
Application Number:
JP2021524442A
Publication Date:
March 06, 2024
Filing Date:
November 06, 2019
Export Citation:
Assignee:
Prodrive Technologies Innovation Services Bafe
International Classes:
H05H1/46; C23C16/50; H01L21/3065
Domestic Patent References:
| JP2017079127A | ||||
| JP2012050296A |
Foreign References:
| US20130009479 | ||||
| US20170291245 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe