Title:
WAFER CHUCK EQUIPPED WITH FIXED MECHANISM OF ROTARY SHAFT
Document Type and Number:
Japanese Patent JPS60117747
Kind Code:
A
Abstract:
PURPOSE:To smooth the rotation of a chuck also in rotation starting and stopping likewise in steady rotation by a method wherein a recess where a rotary shaft can be inserted by a fixed length is formed at the bottom, which recess is then provided with a groove holding the projection, and a hole fixing the rotary shaft in the recess is formed at the bottom. CONSTITUTION:The bottom of the chuck 1 has a plane 5 colliding against the upper layer 6 of the rotary shaft 2, and is provided with the recess 7 where the rotary shaft can be inserted by a fixed length. This recess consists of a hole section 8 holding the body of the shaft and a groove section 10 holding the projection 9 formed integrally with the shaft and extending laterally. Further, the wall of the groove section has holes 11 extending rectangularly thereto. The backlash of the rotary shaft due to the gap between the projection and the wall can be eliminated by tight fixing by pinching the projection of the rotary shaft between the wall of the groove section of the chuck with a clamper such as a ball plunger.
Inventors:
IWATA YOSHIKI
KAWASE NOBUO
TANAKA KEITOKU
MIYAKE TAKASHI
KAWAURA HIROSHI
KAWASE NOBUO
TANAKA KEITOKU
MIYAKE TAKASHI
KAWAURA HIROSHI
Application Number:
JP22623983A
Publication Date:
June 25, 1985
Filing Date:
November 30, 1983
Export Citation:
Assignee:
CANON HANBAI KK
CANON KK
CANON KK
International Classes:
H01L21/67; H01L21/68; H01L21/687; (IPC1-7): H01L21/68
Domestic Patent References:
| JPS377914Y1 | ||||
| JPS4939311A | 1974-04-12 |
Attorney, Agent or Firm:
Marushima Giichi