Title:
ウエハホルダ
Document Type and Number:
Japanese Patent JP4336320
Kind Code:
B2
Abstract:
A wafer holder (15) including a wafer stage (1) and a wafer stage outer-ring (2) surrounding the wafer stage (1) wherein the wafer stage (1) has a diameter smaller than the diameter of a wafer (5) loaded on the wafer stage (1), the wafer stage outer-ring (2) has an inner diameter at the upper side of the outer-ring (2) which is larger than the diameter of the wafer (5) loaded on the wafer stage (1), and the upper surface of the outer-ring (2) lies above the upper surface of the wafer (5) loaded on the wafer stage (1).
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Inventors:
Sunil Wickrumanayaka
Application Number:
JP2005050064A
Publication Date:
September 30, 2009
Filing Date:
February 25, 2005
Export Citation:
Assignee:
Canon ANELVA Corporation
International Classes:
C23C14/34
Domestic Patent References:
| JP7263528A | ||||
| JP2002194540A |
Other References:
恒川孝二,GMR膜と成膜装置,表面技術,1997年,Vol.48 No.11,p.36-41
Attorney, Agent or Firm:
Masao Okabe
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama