Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
WAFER PLACING METHOD AND PLACING DEVICE
Document Type and Number:
Japanese Patent JPH05318310
Kind Code:
A
Abstract:

PURPOSE: To offer a method and device for placing a wafer inside a template of a polishing plate automatically and very accurately without requiring human labor.

CONSTITUTION: When a semiconductor wafer 7 is placed for polishing inside a template 3 provided on a polishing plate 1, respective positions are numerically analyzed for fine adjustment in order to correctly place the semiconductor wafer 7 at the center of the template 3. In a wafer placing device for placing the semiconductor wafer 7 inside the template 3 provided on the polishing plate 1, an index table 2 for holding the polishing plate 1 and rotating, a wafer carrying arm 5 for attracting the wafer 7, moving in the horizontal and vertical directions and placing the wafer 7 inside the template 3, and an image processing device provided above the template 3 for placing the wafer 7 are provided.


Inventors:
INADA YASUO
FUKUSHIMA MASANORI
Application Number:
JP15435092A
Publication Date:
December 03, 1993
Filing Date:
May 21, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIKOSHI MACHINERY CORP
International Classes:
B24B37/00; B24B37/04; B24B37/30; B24B37/32; B24B41/06; H01L21/304; (IPC1-7): B24B37/04; B24B41/06; H01L21/304
Attorney, Agent or Firm:
Ryoichi Yamamoto (1 person outside)



 
Previous Patent: JPS5318309

Next Patent: JPS5318311