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Title:
WATER-BASE RESIN DISPERSION
Document Type and Number:
Japanese Patent JPH10114847
Kind Code:
A
Abstract:

To obtain a water-base resin dispersion which contains a polymer dispersed therein and excellent in water repellecy and lubricity and which has a good storage stability by dispersing a polymer of a monomer having a long- chain aliph. hydrocarbon group to form a dispersion contg. particles with specified particle sizes.

A polymer obtd. by polymerizing a monomer component essentially contg. a polymerizable monomer having a 9-30C aliph. hydrocarbon group is dispersed to give a water-base dispersion which contains fine particles having a vol. average particle size lower than 1μm and in which the ratio of the vol. of particles having sizes of 3μm or higher to the vol. of all the particles is 5% or lower. Examples of the most favorable dispersion stabilizers are a water- soluble or-dispersible polymer which is produced by polymerizing a water-soluble monomer in the presence of a 6C or higher alkylmercaptan and has terminal 6C or higher alkyl groups and a reaction product of a polyamine compd. having at least two prim- or sec-amino groups in the molecule with a compd. represented by the formula (wherein R is a 4-28C hydrocarbon group; A is 2-4C alkylene; X is a group having an aminoreactive group; etc.).


Inventors:
UCHIDA MASAYA
NIKASHIWA TOSHIKI
MINAMI KENJI
IZUMIBAYASHI MASUJI
Application Number:
JP19747397A
Publication Date:
May 06, 1998
Filing Date:
July 23, 1997
Export Citation:
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Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C08L31/02; C08F2/20; C08F2/38; C08F20/02; C08F20/18; C08F20/36; C08F20/58; C08F22/02; C08F22/14; C08L33/00; C08L35/00; C09D131/02; C09D133/00; C09J131/02; D06M15/263; D21H19/20; (IPC1-7): C08L33/00; C08F2/20; C08F2/38; C08F20/02; C08F20/18; C08F20/36; C08F20/58; C08F22/02; C08F22/14; C08L31/02; C08L35/00; C09D131/02; C09D133/00; C09J131/02; D06M15/263; D21H19/20
Attorney, Agent or Firm:
Takehiko Matsumoto