Title:
WATER REPELLING TREATMENT METHOD, THIN-FILM FORMING METHOD, METHOD OF MANUFACTURING ORGANIC EL DEVICE BY USING THE METHOD, ORGANIC EL DEVICE, AND ELECTRONIC EQUIPMENT
Document Type and Number:
Japanese Patent JP3698138
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To solve such problems with the water repelling treatment of a substrate by methods in which fluoro plasma is applied thereto in the atmospheric pressure or vacuum or the substrate is coated with fluoro alkyl treating agent that the treatment requires much labor and foreign matter is adhered thereto.
SOLUTION: The substrate is irradiated with ultraviolet ray 1 while making fluorine compound-contained gas 2 flow on the surface of the substrate for water repelling treatment. By this method, thin-film is formed on the inside walls of a barrier, or an organic EL device is manufactured by a liquid phase method. Specifically, organic film formation, cathode film formation, and sealing are performed by rubbing washing, UV ozone washing, and ultraviolet fluoridization.
Inventors:
Hidekazu Kobayashi
Application Number:
JP2002343968A
Publication Date:
September 21, 2005
Filing Date:
November 27, 2002
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B41J2/01; H01L51/50; H01L51/56; H05B33/10; B05D3/06; B05D5/08; H01L27/32; H01L51/00; H01L51/30; (IPC1-7): H05B33/10; B41J2/01; H05B33/14
Domestic Patent References:
| JP2003257656A | ||||
| JP11188882A | ||||
| JP2001203081A |
Foreign References:
| WO1999048339A1 |
Attorney, Agent or Firm:
Takashi Watanabe
Masatake Shiga
Shinya Mitsuhiro
Masatake Shiga
Shinya Mitsuhiro