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Title:
波面検出装置
Document Type and Number:
Japanese Patent JP5420130
Kind Code:
B2
Abstract:
An arrangement for microlithography includes a projection objective having a plurality of optical elements; an aberration control circuit controlling imaging properties of the projection objective; and at least one operating element associated with an optical element of the projection objective to control imaging properties of the projection objective in response to operating signals generated by the control circuit.

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Inventors:
Ulrich Wekmann
Klaus Freischlat
Application Number:
JP2001562152A
Publication Date:
February 19, 2014
Filing Date:
January 23, 2001
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G01M11/02; G01J9/02; G03F7/20; H01L21/027
Domestic Patent References:
JP3134538A
JP11510249A
JP10132707A
Attorney, Agent or Firm:
Kenji Sugimura
Tatsuya Sawada
Kazuyuki Tomita
Groundwork Kenichi



 
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