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Patent Searching and Data


Title:
WORKING DEVICE AND WORKING METHOD USING ATOMIC FORCE MICROSCOPE
Document Type and Number:
Japanese Patent JP2008096578
Kind Code:
A
Abstract:

To extend a lifetime of a working probe used for a mechanical removal process with an atomic force microscope and to reduce a drift in a probe position during working.

The back face temperature of a working probe 1 penetrating a cantilever 3, is monitored through a minute thermocouple 2 stuck and fixed to the back face 1a; and when the temperature exceeds a predetermined temperature, the working is stopped. The working position is corrected by predicting a drift of the probe position caused by thermal expansion of the cantilever 3 due to the temperature increase of the probe 1, based on the measured temperature of the probe 1. The temperature of the probe 1 is controlled within a predetermined range to continue working by heater-heating or cooling the back face 1a while monitoring through the minute thermocouple 2 stuck and fixed to the back face of the probe 1.


Inventors:
TAKAOKA OSAMU
Application Number:
JP2006276429A
Publication Date:
April 24, 2008
Filing Date:
October 10, 2006
Export Citation:
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Assignee:
SII NANOTECHNOLOGY INC
International Classes:
B81C99/00; B82B3/00; B82Y40/00; G01Q10/06; G01Q20/04; G01Q30/02; G01Q60/24; G01Q80/00; G03F1/72
Attorney, Agent or Firm:
Yoshiharu Matsushita