PURPOSE: To perform quantitative and qualitative analysis on a residual film with high accuracy without splitting a wafer by arranging an X-ray detector inside of an objective lens or inside of a condenser lens or between both lenses.
CONSTITUTION: An accelerated electron beam 1 is vertically radiated to a surface of a sample 2, and the beam diameter is made sufficiently smaller than the size of an accumulating area of a residual film, and accelerating energy is controlled under about 5 kev. Focusing and acceleration are performed by an objective lens 3 and a condenser lens 4. Thereby, an X-ray 5 generated from the residual film is detected in an intermediate position between the lenses 3 and 4 by a detector 6 arranged close to the axis of the electron beam 1. Since the detector 6 can be approached to the electron beam 1, the electron beam 1 is condensed as much as possible. In this way, when energy intensity of of the X-ray 5 is measured by the detector 6, quantitative and qualitative analysis of the residual film can be performed.
KURE TOKUO
NINOMIYA TAKESHI
KURODA KATSUHIRO
NISHIDA TAKASHI
TODOKORO HIDEO
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