Ｘ線回折装置およびＸ線回折測定方法

Japanese Patent JP7207186

B2

To provide an X-ray diffraction device with high accuracy over a wide range from a low angle to a high angle of diffraction.SOLUTION: Provided is an X-ray diffraction device 1 comprising: a sample stage 12 on which a sample is mounted; an X-ray source arm 13 which is provided in the periphery of the sample stage 12, and to which an X-ray source 14 is attached for irradiating the sample on the sample stage 12 with an X-ray; a detector arm 15 which is provided in the periphery of the sample stage 12, and to which a detector 16 is attached for detecting a diffracted X-ray having been reflected from or passed through the sample on the sample stage 12; and an X-ray shielding member 17 which is supported and fixed to one of the X-ray source arm 13 and the detector arm 15, and shields scattered X-rays due to the scattering of X-ray. The X-ray shielding member 17 is arranged by being spaced from the sample by a distance allowing an X-ray or a diffracted X-ray to pass through, supported and secured aslant so that an angle formed with the irradiation direction of the X-ray source 14 or an angle formed with the detection angle of the detector 16 is constant, and provided independently from the sample stage 12.SELECTED DRAWING: Figure 1

Ono Katsushi

JP2019107399A

January 18, 2023

June 07, 2019

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Sumitomo Metal Mining Co., Ltd.

G01N23/20008; G01N23/207; G21K1/06

JP2018028470A
JP2006071320A
JP2000206059A
JP2012177688A
JP11248652A
JP2011247834A

WO2017001165A1

Setsiya Aniya
Masahiro Fukuoka

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