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Patent Searching and Data


Title:
X-RAY EXPOSURE METHOD
Document Type and Number:
Japanese Patent JPS62222634
Kind Code:
A
Abstract:

PURPOSE: To obtain an X-ray intensity 2.5W5 times as high as the intensity available in prior arts and to improve the work efficiency of X-ray exposure, by synchronizing a driving section for vibrating a mirror with a driving section for vibrating a beryllium window by means of a control section.

CONSTITUTION: An X-ray 14 taken from synchrotron radiation light 13 is reflected by a mirror 15 which is vibrated by a driving section 22. The X-ray 14 is applied to an exposure chamber 17 through a beryllium window 16. The window 16 is vibrated vertically by a driving section 33. The operations of the driving sections 22 and 33 are synchronized by a control section 34, whereby the vibration of the mirror 15 is synchronized with the vibration of the window 16 and exposure can be obtained always with an extent of 5mm×50mm. Thus, an X-ray intensity 2.5W5 times as high as that available in prior arts can be obtained and the work efficiency of X-ray exposure can be improved.


Inventors:
OSADA TOSHIHIKO
HONJO ICHIRO
SUGISHIMA KENJI
Application Number:
JP5805586A
Publication Date:
September 30, 1987
Filing Date:
March 18, 1986
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G01N23/00; G03F7/20; G21K1/06; G21K5/00; G21K5/02; H01J35/00; H01L21/027; H05G1/00; (IPC1-7): G01N23/00; G21K5/00; G21K5/02; H01J35/00; H01L21/30
Attorney, Agent or Firm:
Yoshiyuki Osuga