Title:
X-RAY MASK AND ITS MANUFACTURE, MANUFACTURE OF DEVICE USING THE X-RAY MASK AND X-RAY ALIGNER
Document Type and Number:
Japanese Patent JP3224157
Kind Code:
B2
Abstract:
PURPOSE: To perform a high-accuracy exposure operation without causing a distortion in a mask pattern by a method wherein the mask pattern is formed on a mask substrate, the mask substrate is joined to a mask frame so that the mask substrate may have the same shape which is formed by an etching- back operation.
CONSTITUTION: A mask substrate 101 is mounted on a cassette 102; a mask pattern is drawn while an electron beam is applied; after that, the mask substrate is joined to a mask frame 104. The processes are executed to the mask substrate 101 which is warped due to the tensile stress of a membrane. Plate springs 1031, 1032 which are used to press the mask substrate 101 to the inner face of an upper plate in the cassette 102 are installed respectively on the surface inside the cassette 102 at support parts 1081, 1082. Thereby, the mask pattern which is formed on the mask substrate 101 can conform to the criterion.
Inventors:
Takeshi Miyachi
Shinichi Hara
Nobutoshi Mizusawa
Hiroshi Maehara
Shinichi Hara
Nobutoshi Mizusawa
Hiroshi Maehara
Application Number:
JP1099493A
Publication Date:
October 29, 2001
Filing Date:
January 26, 1993
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F1/22; G03F7/20; G21K5/04; H01L21/027; (IPC1-7): H01L21/027; G03F1/16
Domestic Patent References:
| JP62122216A | ||||
| JP198226A | ||||
| JP1309327A | ||||
| JP329313A | ||||
| JP536590A | ||||
| JP5217863A |
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)