Title:
X-RAY PROJECTION ALIGNER
Document Type and Number:
Japanese Patent JP3624523
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain an X-ray projection aligner which prevents a defect from being generated in a resist pattern formed correspond to a mask pattern in an exposure operation by a method wherein a filter is installed close to a photomask arranged in a prescribed position.
SOLUTION: By an illumination optical system 2 at an aligner, a mask 3 is irradiated with X-rays 20 from an X-ray source, a projection image-formation optical system 5 receives X-rays 22 from the mask 3, and a pattern formed on the mask 3 is projected and image-formed on a resist on a wafer 6. At this time, a filter 8 is arranged close to the mask 3 between the mask 3 and the image-formation optical system 5. In addition, it is preferable that the interval between the mask 3 and the filter 8 is larger than the depth of focus on the side of the mask of the image-formation optical system 5. In addition, it is preferable that the filter is provided with at least an X-ray transmission part which transmits X-rays used in an X-ray projection exposure operation. Then, for example, the filter 8 is constituted of a material whose X-ray transmittance is high, and the whole of the filter 8 is formed as an X-ray transmission part.
Inventors:
Tetsuya Oshino
Application Number:
JP4867996A
Publication Date:
March 02, 2005
Filing Date:
March 06, 1996
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G21K5/02; G03F1/22; G03F1/24; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20
Domestic Patent References:
| JP4003414A | ||||
| JP4240716A | ||||
| JP5011437A | ||||
| JP5074688A | ||||
| JP5150445A | ||||
| JP6349715A | ||||
| JP7283116A | ||||
| JP8031718A | ||||
| JP59163741A |
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