Title:
液体金属ターゲットを設けたX線源
Document Type and Number:
Japanese Patent JP2004533105
Kind Code:
A
Abstract:
An X-ray source and an X-ray apparatus with an X-ray source are provided, the X-ray source includes a liquid metal target which flows through a system of ducts and is conducted through a duct section which has a flow cross-section that is reduced relative to that of the system of ducts. The X-ray source provides a pressure source for acting on the liquid metal target such that the pressure in the liquid metal target at the area of the reduced flow cross-section equals essentially a selectable reference value or remains essentially in a pressure range between selectable limit values of the pressure. A comparatively small thickness of a window can thus be realized in conjunction with a comparatively high flow speed.
Inventors:
Harding, jeffrey
Darfitt, Bernd
Eckart, Liner V
Shromka, Jens Pa
Darfitt, Bernd
Eckart, Liner V
Shromka, Jens Pa
Application Number:
JP2003507846A
Publication Date:
October 28, 2004
Filing Date:
June 20, 2002
Export Citation:
Assignee:
Koninklijke Philips Electronics N.V.
International Classes:
H01J35/08; H01J35/16; (IPC1-7): H01J35/08; H01J35/16
Attorney, Agent or Firm:
Tadahiko Ito
Shinsuke Onuki
Tadashige Ito
Shinsuke Onuki
Tadashige Ito