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Title:
スピロ環構造を有する酸脱離性エステル型単量体、高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5499889
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an acid-cleavable ester monomer having a spiro ring structure and useful for producing a base resin giving a resist material having high resolution and small PEB temperature dependency, a polymer compound produced by using the acid-cleavable ester monomer having the spiro ring structure, the resist material containing the polymer compound as the base resin, and a pattern-forming method to use the resist material.SOLUTION: The acid-cleavable ester monomer having the spiro ring structure is expressed by general formula (1) (wherein Z is univalent group having polymerizable double bond; X is bivalent group forming substituted or unsubstituted cyclopentane ring, cyclohexane ring or norbornane ring together with carbon atom bonded thereto; Ris hydrogen atom or univalent hydrocarbon group; Rand Rare each hydrogen atom or univalent hydrocarbon group, or Rand Rare bonded together to form bivalent group forming substituted or unsubstituted cyclopentane ring or cyclohexane ring together with carbon atom bonded thereto; and n is 1 or 2).

Inventors:
Tsuyoshi Kanao
Tomohiro Kobayashi
Justice
Takeshi Watanabe
Koji Hasegawa
Seiichiro Tachibana
Application Number:
JP2010109974A
Publication Date:
May 21, 2014
Filing Date:
May 12, 2010
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F20/18; C07C69/54; C07C69/753; C08F32/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2007507593A
JP2003149817A
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa