An acryl amide derivative, a high molecular compound, and a photoresist constituent

Japanese Patent JP6018504

B2

To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): wherein X represents an oxygen atom or >N-R3; R3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C=O or >S(=O)n; and n is an integer of 0 to 2.

WO/2017/162545	METHOD FOR PRODUCING ATBS AND COPOLYMERS THEREFROM
JP6277806	Ink
JP2001301099	ANTISTATIC FILM FOR IC CARRIER, IC CARRIER COVER TAPE FORMED OF THE FILM, AND IC CARRIER CASE

Kazuhiro Araya
Takashi Fukumoto

JP2012536285A

November 02, 2016

August 25, 2011

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KURARAY CO.,LTD.

C08F20/58; C07D307/93; C07D327/04; C07D493/18; C07D497/18; G03F7/004

JPS57141644A	1982-09-02
JPS61275280A	1986-12-05
JP2012256011A	2012-12-27
JP2011085913A	2011-04-28
JPS57141644A	1982-09-02
JPS61275280A	1986-12-05

Tamotsu Otani
Makoto Kataoka

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